| Description
High Power Impulse Magnetron Sputtering (HiPIMS) is a high-power pulsed power supply system used on magnetron sputtering coating technics. Compared to the traditional DC sputtering system, HiPIMS could generate tens of times higher pulsing current to obtain a ten thousand times higher-density electron plasma. Effectively enhancing-e the ionization rate to obtain a non-porous, high density crystallinity film at lower coating temperatures.
DAH YOUNG's DYHC-H HiPIMS series sputtering coater power supply and chamber cavity are designed to provide, high plasma density (1018~19e-/m3) and high ionization rate (70~100%), increasing the substrate coating compactness. Hesion, flatness and corrosion resistance. The lower duty cycle (
| Features Fully automated control (IPC & PLC). Optional coating deposition methods (Cathode Arc, Magnetron Sputtering, Ion Source, HiPIMS) could be implemented to meet the customers coating requirements. The low-position chamber cavity provides easy operator access. EU and CE safety standards and technical specifications available. Features of PVD coating :
• High abrasion resistance
• Retains hardness under the high operating temperatures
• High oxidation resistance
• Low friction coefficient
• Anti-adhesion
• Scratch resistant
• Various surface colors
| Applications Optoelectronics, Semiconductors, Energy, Machining, Molds, Biomedicine, Micro drill needle, etc. 
